Exhibit dates and hours
Tuesday, February 23: 10:00 AM-5:00 PM
Wednesday, February 24: 10:00 AM-4:00 PM
Location
San Jose McEnery Convention Center
San Jose, California
Directions
Overview
Synopsys provides industry-proven EDA solutions to meet the demands of today’s advanced IC manufacturing processes while setting the standard in platform flexibility to enable innovative and custom solutions for next generation technology nodes. Synopsys’ comprehensive Mask Synthesis, Mask Data Prep, TCAD and Yield Management tools provide leading-edge performance, accuracy, quality and cost of ownership for all your production and development needs. Improve your yield and time to market with Synopsys.
Highlights
Meet with Synopsys
If you are planning to attend SPIE and would like to schedule an onsite meeting with Synopsys Manufacturing, please send an email to manufacturing@synopsys.com with your full name, business title, company name, phone number and the subject you’d like to discuss.
Synopsys Technical Forum
Monday, February 22
12:30 - 4:30 PM
San Jose Marriott
301 South Market Street
San Jose, CA 95113
Directions
Please join us for our 2010 Technical Forum to learn the latest on Synopsys Manufacturing's mask synthesis, mask data prep and lithography simulation solutions. The Technical Forum is peer-to-peer, giving you the opportunity to hear how your lithography colleagues have addressed the challenges of 32nm and beyond.
Agenda
| Time | Presentation Title | Speaker | Company |
| 12:30 | Registration & Lunch |
| 12:45 | Welcome & Introduction | Howard Ko | Synopsys |
| 1:00 | Multiple E-beam Decisions for 22nm and Sub-22nm Lithography | Burn Lin | TSMC |
| 1:45 | 22nm HP Integrated Patterning Improvements for EUVL | Manish Chandhok | Intel |
| 2:15 | Accurate Models for EUV Simulation and Their use for Design Correction | Gian Lorusso | IMEC |
| 2:45 | Calibration of Physics-based Resist Models | Chandra Sarma | Infineon/IBM-ISDA |
| 3:15 | Break |
| 3:30 | A Practical Review Comparing and Contrasting PLRC to SiVL in a Production Environment | John Futrell | Micron |
| 4:00 | Modeling Variable Mask-data Processing Requirements for Enhancing Data Serviceability | Jed Rankin | IBM |
| 4:30 | Drawing & Thank you | George Bailey | Synopsys |
The Technical Forum is full and registration is now closed. Please send an email to manufacturing@synopsys.com with any questions.